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Plastic films/substrates for flexible displays change their dimensions by temperature and humidity
Horizontal PECVD equipment
in the order given below
アニールウェーハを使用する理由のひとつは，アニールウェーハ表層のcrystal originated particles（COP）を減らすことができるということである。バルク欠陥がない領域（denuded zone：DZ）の深さもまた重要なパラメータである。
P00800 - SEMI P8 - Test Method for the Determination of Water in Photoresist Revision:SEMI P8-1111 - Inactive Plastic films/substrates for flexible displaysThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 12, 2011. Available at www. semiviews. org and www. semi. org in November 2011; originally published in 1984; previously published September 1997. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status
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