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An additional purpose of this standard is to provide sufficient information through a combination of on-line services and interface documentation that an IMMC-compliant integrated measurement module may be integrated with multi-module equipment without requiring a software change in either the module or the equipment
OHT）系統。
It also provides reference for typical wastewater composition
13-0698 (first published)
P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks StdPbc-0918 An additional purpose of thisThis Specification covers the mounting requirements for extreme ultraviolet lithography (EUVL) masks in select tools. This Standard details the requirements for EUVL mask mounting. The mask mount is a flat reference surface against which the mask is clamped. The specific design and material of the mask mount are not specified. The mounting requirements in this Standard apply to the EUV exposure tools. These mounting requirements may be used in other
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