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This Practice does not deal with acquisition or analysis of uniformity data where it is desired to take more than one measurement per specified spatial cell such as is commonly done for wafer site flatness measurements
general contractors
cosmetics or any material that may come in contact with the test material
• A model of the behavior to be exhibited by semiconductor manufacturing equipment in a SECS-II communication environment
P00500 - SEMI P5 - Specification for Pellicles StdPbc-0415 This Practice does not dealThis Specification covers the general requirements for pellicles used on photomasks or reticles in photolithographic exposure systems. This Specification covers pellicles for use in either broadband, polychromatic or monochromatic exposure systems. Referenced SEMI Standards (purchase separately) None. Revision History SEMI P5 0416 (Reapproved 1221) SEMI P5 0416 (technical revision) SEMI P5 0704 (technical revision) SEMI P5 94 (Reapproved 1103) SEMI P5
