F00200 - SEMI F2 - Specification for 316L Stainless Steel Tubing for General Purpose Semiconductor Manufacturing Applications Revision:SEMI F2-94 (Withdrawn 0703) - Withdrawn simplify ATE performance monitoring

simplify ATE performance monitoring

マスフロー機器（マスフローコントローラ，マスフロメーターおよび制御バルブ）が，半導体装置に化学物質の供給システムの構成要素部分として使われる。半導体プロセス装置に使われる多くの化学薬品は，装置および人に対して危険である。これら化学薬品に一度曝され，もし取扱が適切でなければ，汚染されたマスフロー機器は，装置の修理要員および装置に危険を与えるであろう。

1-0996 (first published)

and materials acceptance applications

F00200 - SEMI F2 - Specification for 316L Stainless Steel Tubing for General Purpose Semiconductor Manufacturing Applications Revision:SEMI F2-94 (Withdrawn 0703) - Withdrawn simplify ATE performance monitoringNOTICE: This Document was balloted and approved for withdrawal in 2003. The purpose of this Specification is to identify the applicable ASTM tubing specification requirements and to define the special material chemical composition requirements for 316L stainless steel tubing which is to be used for general purpose applications in semiconductor manufacturing facilities. This Specification covers grades of nominal wall thickness stainless steel tubing