P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0416 - Current ウェーハ用過渡モード（Transient Mode for Wafers） —

ウェーハ用過渡モード（Transient Mode for Wafers） — この試験方法は，厚さが1 mm以下のウェーハ形状のシリコン試料に適している。このスタンダードで記述するように，過渡モードは，過剰キャリアライフタイムが光照射の遮断時間と比較して長い場合に用いる。

SEMI M53-0220 (technical revision)

The preferred method for training is to use dedicated training equipment

SEMI PV22 — Specification for Silicon Wafers for Use as Photovoltaic Solar Cells

P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0416 - Current ウェーハ用過渡モード（Transient Mode for Wafers） —This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on February 1, 2016. Available at www. semiviews. org and www. semi. org in April 2016; originally published March 2004; previously published March 2008. The purpose of this Specification is to define an interchange and encapsulation format for hierarchical integrated circuit