C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS) StdDcs-Withdrawn SEMI C20-0301 (technical revision)

SEMI C20-0301 (technical revision)

the sum of the peak height Zp and the valley depth Zv are reported

This Document covers requirements for phosphine used in the semiconductor industry

–工廠委員會之技術認可，同時也是日本平面顯示器工廠自動化委員會的直接責任。目前之版本是在2004年11月24日，由日本區標準委員會所認可。最初可在2005年1月的網址www

C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS) StdDcs-Withdrawn SEMI C20-0301 (technical revision)This Document is to provide a standard of mono dispersed gold nanoparticle (GNP) challenge test for liquid filter rated below 30 nm using inductively coupled plasma mass spectroscopy (ICP MS). This Document covers a mono dispersed GNP challenge test method for below 30 nm rated liquid filter. This Document defines a test condition for mono dispersed GNP challenge test. The following areas are to be addressed in this Document: The test condition such