M04900 - SEMI M49 - Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 16 nm Technology Generations Revision:SEMI M49-0613 - Superseded for measuring its size

for measuring its size

and optimized maintenance concepts

SEMI E22-0697 (technical revision)

it makes sense to use the same wafer support configuration when measuring TTV

M04900 - SEMI M49 - Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 16 nm Technology Generations Revision:SEMI M49-0613 - Superseded for measuring its sizeThis Guide provides recommendations for specifying measurement systems for geometry and flatness of silicon wafers of the 130, 90, 65, 45, 32, 22, and 16 nm technology generation as anticipated by the International Technology Roadmap for Semiconductors (ITRS) and in the forecasts of the major manufacturers of semiconductor devices. Wafer parameters as defined by SEMI M1, SEMI M8, SEMI M11, SEMI M24, or SEMI M38 are specified by customers of silicon