E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles StdPbc-0723 SEMI C33-0699 (first published -

SEMI C33-0699 (first published - replaces SEMI C1

The purpose of this Standard is to introduce Wafer Flow Job (WFJ) in order to manage multiple WJs in the equipment

SEMI E128-0304 (technical revision)

SEMI E78-0309 (technical revision)

E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles StdPbc-0723 SEMI C33-0699 (first published -This Standard specifies EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6 inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL. This Standard is intended to set an appropriate level of specification that places minimal limits on innovation while ensuring modularity and