G07800 - SEMI G78 - Test Method for Comparing Automated Wafer Probe Systems Utilizing Process-Specific Measurements Revision:SEMI G78-0699 - Superseded SEMI S1-0308 (technical revision) -

SEMI S1-0308 (technical revision) - pulled from publication

This Practice defines and specifies all of the pretreatment and analysis preparation procedures for liquid chemical distribution system components and neat polymers common to SEMI F48 and SEMI F57

This Test Method is intended to cover SI GaAs samples with an electrical resistivity in the range from 1 × 106 to 5 × 108 Ω·cm

Examples of test equipment failure information include bit map data

G07800 - SEMI G78 - Test Method for Comparing Automated Wafer Probe Systems Utilizing Process-Specific Measurements Revision:SEMI G78-0699 - Superseded SEMI S1-0308 (technical revision) -This test method was technically approved by the global Automated Test Equipment Committee and is the direct responsibility of the North American Automated Test Equipment Committee. Current edition approved by the North American Regional Standards Committee on December 18, 1998. Initially available at www. semi. org April 1999; to be published June 1999. To define the terms and provide a means of comparative, or relative measurement for the automated